Nanotechnology/Lithography

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Lithography[edit | edit source]

Electron beam lithography[edit | edit source]

Electron beam lithography (EBL)

Nano imprint lithography (NIL)[edit | edit source]

Nanoimprint lithography (NIL)

Focused Ion Beam Techniques[edit | edit source]

Focused Ion Beam Techniques

Electron Beam Induced Deposition (EBID or EBD)[edit | edit source]

The highly focused electron beam in a SEM is used for imaging nanostructures, but it can also be used to make nanoscale deposits. In the presence of carbonaceous or organometallic gasses in the SEM chamber, electron beam induced deposition (EBID or electron beam deposition (EBD)) can be used to construct three-dimensional nanostructures or solder/glue nanostructures.

There is module in this handbook dedicated to EBID

References[edit | edit source]

See also notes on editing this book about how to add references Nanotechnology/About#How_to_contribute.