Nanotechnology/Lithography

From Wikibooks, open books for an open world
< Nanotechnology
Jump to: navigation, search
Navigate
<< Prev: Self assembly
>< Main: Nanotechnology
>> Next: Nanomanipulation

Down: Module on EBID


Lithography[edit]

Electron beam lithography[edit]

Electron beam lithography (EBL)

Nano imprint lithography (NIL)[edit]

Nanoimprint lithography (NIL)

Focused Ion Beam Techniques[edit]

Focused Ion Beam Techniques

Electron Beam Induced Deposition (EBID or EBD)[edit]

The highly focused electron beam in a SEM is used for imaging nanostructures, but it can also be used to make nanoscale deposits. In the presence of carbonaceous or organometallic gasses in the SEM chamber, electron beam induced deposition (EBID or electron beam deposition (EBD)) can be used to construct three-dimensional nanostructures or solder/glue nanostructures.

There is module in this handbook dedicated to EBID

References[edit]

See also notes on editing this book about how to add references Nanotechnology/About#How_to_contribute.